850V High Power GaN-on-Si Epi Wafer

Takaitaccen Bayani:

850V High Power GaN-on-Si Epi Wafer- Gano ƙarni na gaba na fasahar semiconductor tare da Semicera's 850V High Power GaN-on-Si Epi Wafer, wanda aka ƙera don ingantacciyar aiki da inganci a aikace-aikacen wutar lantarki mai girma.


Cikakken Bayani

Tags samfurin

Semiceragabatar da850V High Power GaN-on-Si Epi Wafer, ci gaba a cikin haɓakar semiconductor. Wannan ci-gaba epi wafer ya haɗu da babban inganci na Gallium Nitride (GaN) tare da ƙimar farashi na Silicon (Si), ƙirƙirar ingantaccen bayani don aikace-aikacen wutar lantarki mai ƙarfi.

Mabuɗin fasali:

Babban Karfin Wutar Lantarki: Injiniya don tallafawa har zuwa 850V, wannan GaN-on-Si Epi Wafer yana da kyau don buƙatar wutar lantarki, yana ba da damar inganci da aiki mafi girma.

Ingantattun Ƙarfin Ƙarfi: Tare da ingantaccen motsi na lantarki da haɓakar zafin jiki, fasahar GaN tana ba da damar ƙirar ƙira da ƙara ƙarfin ƙarfi.

Magani Mai Tasirin Kuɗi: Ta hanyar yin amfani da siliki a matsayin ma'auni, wannan epi wafer yana ba da madadin farashi mai mahimmanci ga wafers na GaN na gargajiya, ba tare da lalata inganci ko aiki ba.

Faɗin Aikace-aikacen: Cikakken don amfani a cikin masu canza wuta, RF amplifiers, da sauran na'urorin lantarki masu ƙarfi, tabbatar da aminci da dorewa.

Bincika makomar fasaha mai ƙarfi tare da Semicera's850V High Power GaN-on-Si Epi Wafer. An ƙera shi don aikace-aikacen yanke-yanke, wannan samfurin yana tabbatar da cewa na'urorin lantarki ɗinku suna aiki tare da matsakaicin inganci da aminci. Zaɓi Semicera don buƙatun semiconductor na gaba na gaba.

Abubuwa

Production

Bincike

Dummy

Crystal Parameters

Polytype

4H

Kuskuren daidaita yanayin saman

<11-20>4±0.15°

Ma'aunin Wutar Lantarki

Dopant

n-nau'in Nitrogen

Resistivity

0.015-0.025ohm · cm

Ma'aunin injina

Diamita

150.0 ± 0.2mm

Kauri

350± 25 μm

Matsakaicin firamare

[1-100]±5°

Tsawon lebur na farko

47.5 ± 1.5mm

Filayen sakandare

Babu

TTV

≤5m ku

≤10 μm

≤15 μm

LTV

≤3 μm (5mm*5mm)

≤5 μm (5mm*5mm)

≤10 μm (5mm*5mm)

Ruku'u

- 15 μm ~ 15 μm

- 35 μm ~ 35 μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Gaba (Si-face) rashin ƙarfi (AFM)

Ra≤0.2nm (5μm*5μm)

Tsarin

Yawan bututu

<1 ku/cm2

<10 a/cm2

<15 ku/cm2

Karfe najasa

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Ingancin Gaba

Gaba

Si

Ƙarshen saman

Farashin CMP

Barbashi

≤60ea/wafer (size≥0.3μm)

NA

Scratches

≤5ea/mm. Tarin tsayin ≤ Diamita

Tsawon tsayi≤2*Diamita

NA

Bawon lemu/ramuka/tabo/tabas/ fasa/kamuwa

Babu

NA

Gefen kwakwalwan kwamfuta / indents / karaya / hex faranti

Babu

Yankunan polytype

Babu

Tarin yanki≤20%

Tarin yanki≤30%

Alamar Laser ta gaba

Babu

Kyakkyawan Baya

Baya gamawa

C-face CMP

Scratches

≤5ea/mm, Tsawon Tara≤2* Diamita

NA

Lalacewar baya (guntuwar baki/indents)

Babu

Baƙar fata

Ra≤0.2nm (5μm*5μm)

Alamar Laser na baya

1 mm (daga saman gefen)

Gefen

Gefen

Chamfer

Marufi

Marufi

Epi- shirye tare da marufi

Marufin kaset mai yawa-wafer

* Bayanan kula: "NA" yana nufin babu buƙatar Abubuwan da ba a ambata ba suna iya komawa zuwa SEMI-STD.

tech_1_2_size
SiC wafers

  • Na baya:
  • Na gaba: