Ga2O3 Substrate

Takaitaccen Bayani:

Ga2O3Substrate- Buɗe sabbin dama a cikin wutar lantarki da optoelectronics tare da Semicera's Ga2O3Substrate, wanda aka ƙera don yin aiki na musamman a cikin babban ƙarfin lantarki da aikace-aikacen mitoci mai girma.


Cikakken Bayani

Tags samfurin

Semicera yana alfaharin gabatar daGa2O3Substrate, wani sabon abu da aka shirya don yin juyin juya hali na lantarki da optoelectronics.Gallium oxide (Ga2O3) substratesan san su don babban bandgap ɗin su, wanda ya sa su dace don babban iko da na'urori masu tsayi.

 

Mabuɗin fasali:

• Ƙarfafa Faɗin Bandgap: Ga2O3 yana ba da gaɓoɓin bandeji na kusan 4.8 eV, yana haɓaka ikonsa don ɗaukar manyan ƙarfin lantarki da yanayin zafi idan aka kwatanta da kayan gargajiya kamar Silicon da GaN.

• Babban Rushewar Wutar Lantarki: Tare da filin rushewa na musamman, daGa2O3Substratecikakke ne ga na'urorin da ke buƙatar aiki mai ƙarfi, yana tabbatar da inganci da aminci.

• Ƙarfafawar thermal: Ƙarfafawar yanayin zafi na kayan yana sa ya dace da aikace-aikace a cikin matsanancin yanayi, yana riƙe da aiki ko da a cikin yanayi mai tsanani.

• Aikace-aikace iri-iri: Mafi dacewa don amfani a cikin manyan transistor wutar lantarki, na'urorin optoelectronic UV, da ƙari, suna ba da tushe mai ƙarfi don ci-gaba na tsarin lantarki.

 

Ƙware makomar fasahar semiconductor tare da Semicera'sGa2O3Substrate. An ƙera shi don biyan buƙatun na'urorin lantarki masu ƙarfi da mitoci masu girma, wannan ma'auni yana saita sabon ma'auni don aiki da dorewa. Amince Semicera don isar da sabbin hanyoyin magance aikace-aikacenku mafi ƙalubale.

Abubuwa

Production

Bincike

Dummy

Crystal Parameters

Polytype

4H

Kuskuren daidaita yanayin saman

<11-20>4±0.15°

Ma'aunin Wutar Lantarki

Dopant

n-nau'in Nitrogen

Resistivity

0.015-0.025ohm · cm

Ma'aunin injina

Diamita

150.0 ± 0.2mm

Kauri

350± 25 μm

Matsakaicin firamare

[1-100]±5°

Tsawon lebur na farko

47.5 ± 1.5mm

Filayen sakandare

Babu

TTV

≤5m ku

≤10 μm

≤15 μm

LTV

≤3 μm (5mm*5mm)

≤5 μm (5mm*5mm)

≤10 μm (5mm*5mm)

Ruku'u

- 15 μm ~ 15 μm

- 35 μm ~ 35 μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Gaba (Si-face) rashin ƙarfi (AFM)

Ra≤0.2nm (5μm*5μm)

Tsarin

Yawan bututu

<1 ku/cm2

<10 a/cm2

<15 ku/cm2

Karfe najasa

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Ingancin Gaba

Gaba

Si

Ƙarshen saman

Farashin CMP

Barbashi

≤60ea/wafer (size≥0.3μm)

NA

Scratches

≤5ea/mm. Tarin tsayin ≤ Diamita

Tsawon tsayi≤2*Diamita

NA

Bawon lemu/ramuka/tabo/tabas/ fasa/kamuwa

Babu

NA

Gefen kwakwalwan kwamfuta / indents / karaya / hex faranti

Babu

Yankunan polytype

Babu

Tarin yanki≤20%

Tarin yanki≤30%

Alamar Laser ta gaba

Babu

Kyakkyawan Baya

Baya gamawa

C-face CMP

Scratches

≤5ea/mm, Tsawon Tara≤2* Diamita

NA

Lalacewar baya (guntuwar baki/indents)

Babu

Baƙar fata

Ra≤0.2nm (5μm*5μm)

Alamar Laser na baya

1 mm (daga saman gefen)

Gefen

Gefen

Chamfer

Marufi

Marufi

Epi- shirye tare da marufi

Marufin kaset mai yawa-wafer

* Bayanan kula: "NA" yana nufin babu buƙatar Abubuwan da ba a ambata ba suna iya komawa zuwa SEMI-STD.

tech_1_2_size
SiC wafers

  • Na baya:
  • Na gaba: