M CVD SILICON CARBIDE sassan ana gane su azaman zaɓi na farko don zoben RTP / EPI da tushe da sassan plasm aetch cavity waɗanda ke aiki a babban tsarin da ake buƙata yanayin yanayin aiki (> 1500 ℃), buƙatun don tsabta sun fi girma (> 99.9995%) kuma aikin yana da kyau musamman lokacin da juriya ga sinadarai ya yi yawa musamman. Waɗannan kayan ba su ƙunshi matakai na biyu a gefen hatsi ba, don haka abubuwan haɗinsu suna samar da ƙarancin barbashi fiye da sauran kayan. Bugu da ƙari, ana iya tsaftace waɗannan abubuwan da aka gyara ta amfani da HF/HCl mai zafi tare da ƙarancin lalacewa, yana haifar da ƙananan ƙwayoyin cuta da kuma tsawon rayuwar sabis.
