Menene CVD SiC
Kemikal tururi ajiya (CVD) tsari ne na tsugunar ruwa da ake amfani da shi don samar da ingantaccen kayan aiki masu tsafta. Ana amfani da wannan tsari sau da yawa a filin masana'anta na semiconductor don samar da fina-finai na bakin ciki a saman wafers. A cikin aiwatar da shirye-shiryen SiC ta CVD, ana fallasa ɓangarorin zuwa ɗaya ko fiye masu canzawa masu canzawa, waɗanda ke amsa sinadarai a saman ƙasa don saka ajiyar SiC da ake so. Daga cikin hanyoyi da yawa don shirya kayan SiC, samfuran da aka shirya ta hanyar isar da tururin sinadarai suna da daidaito da tsabta, kuma hanyar tana da ƙarfin sarrafa tsari.
Abubuwan CVD SiC sun dace sosai don amfani a cikin masana'antar semiconductor waɗanda ke buƙatar kayan aiki masu inganci saboda haɗin haɗinsu na musamman na kyawawan abubuwan thermal, lantarki da sinadarai. Ana amfani da sassan CVD SiC sosai a cikin kayan aiki na etching, kayan aikin MOCVD, Si kayan aikin epitaxial da kayan aikin SiC epitaxial, kayan aikin sarrafa zafi da sauri da sauran filayen.
Gabaɗaya, mafi girman ɓangaren kasuwa na abubuwan CVD SiC shine etching abubuwan kayan aiki. Saboda ƙarancin amsawar sa da haɓakawa ga iskar chlorine- da fluorine mai ɗauke da etching, CVD silicon carbide abu ne mai kyau don abubuwan haɗin gwiwa kamar zoben mayar da hankali a cikin kayan etching na plasma.
Abubuwan haɗin carbide na CVD a cikin kayan aikin etching sun haɗa da zoben mayar da hankali, shugabannin shawa gas, trays, zoben gefen, da sauransu. Ɗaukar zoben mayar da hankali a matsayin misali, zoben mayar da hankali shine muhimmin sashi da aka sanya a waje da wafer kuma kai tsaye cikin hulɗa da wafer. Ta hanyar yin amfani da wutar lantarki zuwa zobe don mayar da hankali kan plasma da ke wucewa ta zoben, plasma yana mai da hankali kan wafer don inganta daidaituwar aiki.
An yi zoben mayar da hankali na al'ada da silicon ko quartz. Tare da ci gaban haɗaɗɗun miniaturization na kewayawa, buƙatu da mahimmancin hanyoyin etching a cikin masana'antar keɓaɓɓun keɓaɓɓu suna ƙaruwa, kuma ƙarfi da kuzarin etching plasma na ci gaba da ƙaruwa. Musamman, makamashin plasma da ake buƙata a cikin kayan aikin etching plasma capacitively (CCP) ya fi girma, don haka ƙimar amfani da zoben mayar da hankali da aka yi da kayan silicon carbide yana ƙaruwa. Ana nuna zane-zane na CVD silicon carbide zoben mayar da hankali a ƙasa:
Lokacin aikawa: Juni-20-2024