PART/1CVD (Chemical Vapor Deposition): A 900-2300 ℃, ta amfani da TaCl5 da CnHm a matsayin tantalum da carbon kafofin, H₂ matsayin rage yanayi, Ar₂as m gas, dauki dauki film. Rufin da aka shirya shi ne m, uniform da high tsarki. Duk da haka, akwai wasu matsaloli ...
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